High-Purity Al2O3 Ceramic Susceptor Plates Semiconductor Grade for Wafer Processing Equipment Parts

Semiconductor wafer processing demands materials that neither shed particles nor leach metallic contamination into the process environment. Our High-Purity Al2O3 Ceramic Susceptor Plates are manufactured from 99.5% alpha alumina with tightly controlled trace element levels, then fired in a clean production line to produce a fully dense, pore-free body that stays chemically silent even under plasma and high bias conditions.

Each plate is diamond ground and lapped to a flatness suitable for uniform wafer support, with an optional mirror polish that simplifies cleaning and reduces particle trapping between process runs. The material combines high electrical resistivity at operating temperature, excellent thermal conductivity for even heat distribution, and the mechanical rigidity required to hold tight dimensional tolerances across repeated thermal cycles.

• Ultra-high purity: 99.5% alumina with minimized sodium, iron and heavy metal content protects sensitive wafer surfaces from contamination.
• Fully dense microstructure: Zero open porosity prevents process gas absorption and outgassing that could disturb chamber pressure stability.
• Thermal uniformity: High thermal conductivity spreads heat evenly across the wafer plane, improving film thickness and etch rate uniformity.
• High temperature stability: Components operate reliably at elevated process temperatures without deformation or strength loss.
• Plasma and chemical resistance: The inert alumina surface withstands aggressive fluorine and chlorine based chemistries used in etch and deposition.
• Precision machined features: Holes, counterbores, lift pin channels and edge profiles are machined to tight drawing tolerances.
• Clean room ready packaging: Parts are cleaned, individually sealed and double bagged to preserve surface quality during shipment.

These susceptor plates are designed for semiconductor equipment parts including wafer support pedestals in CVD and PVD chambers, etch electrode assemblies, rapid thermal processing stages and ion implantation fixtures. The material also suits flat panel and photovoltaic processing tools that share the same cleanliness requirements.

Where original equipment manufacturers need a domestic source for consumable ceramic components, we manufacture strictly to the customer drawing and can supply matched sets with verified flatness, concentricity and surface finish data for each individual serial number.

Semiconductor grade parts are cleaned in deionized water baths, dried in a controlled environment and sealed in antistatic bags inside rigid foam-lined boxes to prevent surface damage in transit.

Each shipment includes dimensional inspection certificates, material purity analysis and a surface quality report. Parts are traceable by laser engraved serial number on request.